Company Filing History:
Years Active: 2025
Title: Jisoo Im: Innovator in Substrate Processing Technology
Introduction
Jisoo Im is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of substrate processing technology, particularly through his innovative patent.
Latest Patents
Jisoo Im holds a patent for a "Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the same." This invention discloses plasma baffles, substrate processing apparatuses, and substrate processing methods. The plasma baffle consists of a lower ring, an upper ring that extends vertically outside the lower ring, and an intermediate ring that forms an acute angle with respect to a horizontal direction. The lower ring features a lower central hole that vertically penetrates its center, along with multiple lower slits that also vertically penetrate the ring. The intermediate ring includes an intermediate slit that connects its inner and outer lateral surfaces. Notably, the area ratio of the lower slits to the lower ring is equal to or greater than approximately 59%.
Career Highlights
Jisoo Im is currently employed at Samsung Electronics Co., Ltd., where he continues to develop and refine technologies related to substrate processing. His work has positioned him as a key figure in the advancement of this technology.
Collaborations
He has collaborated with notable coworkers, including Hakyoung Kim and Dowon Kim, contributing to various projects within the company.
Conclusion
Jisoo Im's innovative work in substrate processing technology exemplifies the impact of dedicated inventors in advancing industrial applications. His contributions are significant in shaping the future of substrate processing methods.