Jiro Ogura

Title: Jiro Ogura: Innovator in Polymer Technology

Introduction

Jiro Ogura is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of polymer technology, particularly in the development of materials that exhibit unique properties. With a total of 3 patents to his name, Ogura continues to push the boundaries of innovation in his industry.

Latest Patents

Ogura's latest patents include a "Radioactive ray-resistant stabilizer," which is a resin composition that incorporates an alkyl-substituted condensed tetracyclic hydrocarbon compound. This invention aims to enhance the durability of materials exposed to radioactive rays. Another significant patent is for "Dielectric ethylene copolymer compositions containing alkylfluoranthene." This patent describes ethylene copolymer compositions that possess excellent dielectric properties, utilizing an alkylfluoranthene compound to improve performance.

Career Highlights

Jiro Ogura is currently employed at Kureha Kagaku Kogyo Kabushiki Kaisha, a company known for its innovative chemical products. His work at Kureha has allowed him to focus on developing advanced materials that meet the demands of modern technology. His expertise in polymer science has positioned him as a key player in the industry.

Collaborations

Ogura has collaborated with several talented individuals throughout his career, including Masaaki Takahashi and Akira Ito. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jiro Ogura's contributions to polymer technology and his innovative patents highlight his role as a leading inventor in his field. His work continues to influence the development of advanced materials that are essential for various applications.