Jingjun Yang

Title: Innovations of Jingjun Yang in Microelectronics

Introduction

Jingjun Yang is a prominent inventor based in Cary, NC (US), known for his significant contributions to the field of microelectronics. With a total of 6 patents to his name, Yang has developed innovative processes that enhance the production of low dielectric constant materials, which are crucial for microelectronic devices.

Latest Patents

Yang's latest patents focus on the electron beam modification of chemical vapor deposited (CVD) films. One of his notable inventions is a process for forming low dielectric constant dielectric films. This process involves the chemical vapor deposition of a monomeric or oligomeric dielectric precursor onto a substrate. After the layer is formed, it can be optionally heated to dry it. The layer is then exposed to electron beam radiation, which modifies the layer through a carefully controlled process involving time, temperature, energy, and dose. This innovative approach allows for the production of high-quality dielectric layers essential for advanced microelectronic applications.

Career Highlights

Throughout his career, Jingjun Yang has worked with reputable companies such as AlliedSignal Inc. and Applied Materials, Inc. His experience in these organizations has contributed to his expertise in the field of microelectronics and patent development.

Collaborations

Yang has collaborated with notable professionals in his field, including Matthew F. Ross and Lynn Forester. These collaborations have likely enriched his work and contributed to the advancement of microelectronic technologies.

Conclusion

Jingjun Yang's innovative work in the development of low dielectric constant materials through electron beam modification has made a significant impact on the microelectronics industry. His contributions continue to influence the production of advanced microelectronic devices.