Jin Wuk Sung

Title: Innovations of Jin Wuk Sung in Photoresist Technology

Introduction

Jin Wuk Sung is an accomplished inventor based in Worcester, MA, known for his contributions to the field of photoresist technology. With a focus on enhancing the performance of photoresist compositions, he has made significant strides in the industry.

Latest Patents

Jin Wuk Sung holds a patent for "Photoresists comprising multiple acid generator compounds." This invention relates to new photoresist compositions that include a polymer with an acid generator bonded to it, as well as an acid generator compound that is not bonded to the polymer and contains one or more acid-labile groups. This innovative approach aims to improve the efficiency and effectiveness of photoresist materials used in various applications.

Career Highlights

Jin Wuk Sung is currently employed at DuPont Electronic Materials International, LLC, where he continues to develop cutting-edge technologies in the field of electronic materials. His work has contributed to advancements in the manufacturing processes of semiconductors and other electronic devices.

Collaborations

Throughout his career, Jin has collaborated with notable colleagues, including James W. Thackeray and Paul J. LaBeaume. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jin Wuk Sung's contributions to photoresist technology exemplify the impact of innovative thinking in the field of electronic materials. His patent and ongoing work at DuPont Electronic Materials International, LLC, highlight his commitment to advancing technology in this critical area.