Company Filing History:
Years Active: 2014
Title: Innovations by Jin-Jang Jheng in Silicon Wafer Technology
Introduction
Jin-Jang Jheng is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of silicon wafer processing. His innovative methods aim to enhance the quality and performance of silicon wafers used in various electronic applications.
Latest Patents
Jheng holds a patent for an "In-situ gettering method for removing metal impurities from the surface and interior of an upgraded metallurgical grade silicon wafer." This method involves a continuous process conducted in a reaction chamber where chloride gas is mixed with a carrier gas. The gaseous mixture is utilized to clean the surface of the silicon wafer and to form a porous structure before executing hot annealing. This innovative approach effectively improves external gettering and removes interstitial-type metal impurities from the silicon wafer's interior. He has 1 patent to his name.
Career Highlights
Jin-Jang Jheng is affiliated with the Institute of Nuclear Energy Research, Atomic Energy Council. His work at this institution has allowed him to focus on advanced research in semiconductor materials and processes. His contributions have been instrumental in improving the efficiency and reliability of silicon wafers.
Collaborations
Jheng has collaborated with esteemed colleagues such as Tsun-Neng Yang and Chin-Chen Chiang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of semiconductor research.
Conclusion
Jin-Jang Jheng's innovative work in silicon wafer technology exemplifies the importance of research and development in advancing semiconductor manufacturing. His contributions continue to impact the industry positively, paving the way for future innovations.