Jim Nester

Title: Jim Nester: Innovator in Plasma Assisted Chemical Etching

Introduction

Jim Nester is a notable inventor based in Ridgefield, CT (US). He has made significant contributions to the field of chemical etching, particularly in the development of technologies for large flat panel displays. His innovative approach has led to the creation of a unique patent that enhances the precision of circuit pattern formation.

Latest Patents

Jim Nester holds a patent for "Localized plasma assisted chemical etching through a mask." This invention describes a system designed for the formation of circuit patterns on large flat panel displays using plasma assisted chemical etching. The technology allows for a uniform or controllably nonuniform etch depth across the display area. The process involves placing a substrate adjacent to a plasma etching tool, which is smaller than the substrate's surface area. The etching tool is then scanned across the substrate to transfer the pattern from a photolithographic mask. This innovative method aims to improve the accuracy and efficiency of etching processes in display manufacturing.

Career Highlights

Jim Nester is currently employed at Ipec Precision Inc., where he continues to develop and refine his innovative technologies. His work has been instrumental in advancing the capabilities of plasma etching techniques, contributing to the overall progress in the field of display technology.

Collaborations

Jim collaborates with David Bollinger, a fellow innovator in the industry. Their partnership has fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Jim Nester's contributions to the field of plasma assisted chemical etching have positioned him as a key figure in the advancement of display technology. His innovative patent reflects his commitment to enhancing manufacturing processes and improving product quality.