Jihyun Lee

Title: Jihyun Lee: Innovator in Substrate Treatment Technologies

Introduction

Jihyun Lee is a prominent inventor based in Cheonan-si, South Korea. She has made significant contributions to the field of substrate treatment technologies, holding a total of 3 patents. Her innovative work focuses on improving the efficiency and effectiveness of substrate treatment processes.

Latest Patents

Jihyun Lee's latest patents include a substrate treating apparatus and a substrate treating method. The first patent discloses a substrate treating apparatus that features an imaging unit capable of photographing the loci of discharge liquids from multiple nozzles. This apparatus also includes an inspection unit that calculates the impact points of these discharge liquids and determines their normalcy. The inspection unit is equipped with an image synthesizing unit, a pre-processing unit, and a calculation unit that compares pre-processed image data to assess the impact points.

The second patent relates to a substrate treating apparatus with an edge treating unit. This innovative concept allows for the removal of various treating liquid or cleaning solution films from the edge region of a substrate without damaging the treated surface, even when the substrate is rotated in an eccentric state.

Career Highlights

Jihyun Lee is currently employed at Semes Co., Ltd., where she continues to develop cutting-edge technologies in substrate treatment. Her work has garnered attention for its practical applications in various industries, enhancing the quality and reliability of substrate processing.

Collaborations

Jihyun collaborates with notable colleagues, including Ohyeol Kwon and Young Ho Choo, who contribute to her innovative projects and research endeavors.

Conclusion

Jihyun Lee's contributions to substrate treatment technologies exemplify her dedication to innovation and excellence in her field. Her patents reflect a commitment to advancing technology and improving industrial processes.