Company Filing History:
Years Active: 2022-2025
Title: Innovations and Contributions of Inventor Jie Zhang
Introduction
Jie Zhang is a prominent inventor based in Chongqing, China, known for his significant contributions to the field of high-voltage capacitors and robotics. With a total of five patents to his name, Zhang has demonstrated a commitment to advancing technology through innovative solutions.
Latest Patents
One of Jie Zhang's latest patents is a method and system for initial self-healing type classification of metallized film capacitors. This invention relates to the technical field of high-voltage capacitors and involves applying voltages at different ramp rates to determine the voltage bearing range of the capacitors. The method also establishes an initial self-healing voltage-energy database to classify the capacitors based on their performance and service life.
Another notable patent is a neural network-based method for calibration and localization of indoor inspection robots. This method enhances the localization accuracy of indoor robots by minimizing odometry errors through a well-trained neural network model. The process includes presetting positions for signal sources, computing the robot's actual path, and optimizing the predicted path for improved performance.
Career Highlights
Jie Zhang has worked at esteemed institutions such as Chongqing University and the Star Institute of Intelligent Systems. His work at these organizations has allowed him to collaborate with other experts in the field and contribute to groundbreaking research and development.
Collaborations
Some of Jie Zhang's notable coworkers include Yongduan Song and Junfeng Lai. Their collaborative efforts have furthered advancements in their respective fields and have led to innovative solutions in technology.
Conclusion
Jie Zhang's contributions to the fields of high-voltage capacitors and robotics exemplify his dedication to innovation and technology. His patents reflect a deep understanding of complex systems and a commitment to improving performance and accuracy in engineering applications.