Company Filing History:
Years Active: 2019-2020
Title: Innovations of Jie Zhang in Lithography and IC Layouts
Introduction
Jie Zhang is an accomplished inventor based in Clifton Park, NY (US), known for his significant contributions to the fields of lithography and integrated circuit (IC) design. With a total of three patents to his name, Zhang has developed innovative methods that enhance the accuracy and efficiency of semiconductor manufacturing processes.
Latest Patents
One of Jie Zhang's latest patents is titled "System and method for analyzing printed masks for lithography based on representative contours." This invention involves a method that converts images of printed masks into a plurality of representative contours. It determines whether the printed mask contains defects by checking if these contours violate specific contour tolerances. If violations are found, the system identifies the locations of these issues and generates instructions to adjust the mask layout accordingly. Conversely, if no violations are detected, the layout is flagged as compliant.
Another notable patent is "Prediction of process-sensitive geometries with machine learning." This method predicts process-sensitive geometries (PSGs) in proposed IC layouts by analyzing violations of processing constraints. The predictive model is trained using a repository of optical rule check (ORC) simulations. The invention also includes mechanisms for adjusting the predictive model based on actual PSGs found in manufactured circuits, ensuring continuous improvement in prediction accuracy.
Career Highlights
Jie Zhang is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work focuses on advancing lithography techniques and improving IC layout predictions, which are critical for the production of high-performance chips. His innovative approaches have contributed to the company's reputation for excellence in semiconductor technology.
Collaborations
Zhang collaborates with talented colleagues, including Liang Cao and David N Power, who share his commitment to innovation in semiconductor manufacturing. Together, they work on projects that push the boundaries of current technologies and improve manufacturing processes.
Conclusion
Jie Zhang's contributions to lithography and IC design exemplify the impact of innovation in the semiconductor industry. His patents reflect a deep understanding of complex manufacturing processes and a commitment to enhancing the efficiency and accuracy of semiconductor production.