Company Filing History:
Years Active: 2023
Title: Jianzhao Li: Innovator in Phosphorus-Containing Silane Compounds
Introduction: Jianzhao Li is an esteemed inventor based in Zhongshan, China, recognized for his significant contribution to the field of chemical engineering. His innovation in phosphorus-containing silane compounds has paved the way for advancements in various industrial applications.
Latest Patents: Jianzhao Li holds a patent for a phosphorus-containing silane compound, detailing a structure represented as SiR(R)(R). In this compound, R is designated as a phenyl group, while another R represents a vinyl group. The patent also describes a comprehensive method for synthesizing the phosphorus-containing silane compound, as well as a resin composition that incorporates the compound alongside a resin additive. Additionally, the resultant article from this innovation can include a prepreg, resin film, laminate, or printed circuit board. Notably, this invention enhances several critical properties, including the Z-axis ratio of thermal expansion, copper foil peeling strength, inner resin flow, branch-like pattern, dielectric constant, dissipation factor, and flame retardancy.
Career Highlights: Jianzhao Li is currently employed at Elite Electronic Material (Zhongshan) Co., Ltd., where he has been instrumental in pioneering research that bridges materials science and practical applications. His career reflects a commitment to innovation, particularly in enhancing material performance for electronic components.
Collaborations: In his endeavors, Jianzhao has collaborated with esteemed colleagues, including Zhilong Hu and Changyuan Li. Together, they contribute to the advancements of electronic materials through their collective expertise and innovative spirit.
Conclusion: Jianzhao Li's work exemplifies the impact of innovative thinking in the field of materials science. His patent on phosphorus-containing silane compounds illustrates his dedication to improving the functionality and safety of electronic materials. Through his contributions, he continues to influence the future of technology and engineering.