Jian-Xin Lei

Title: Innovations of Jian-Xin Lei in Magnetron Technology

Introduction

Jian-Xin Lei is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of magnetron technology. His innovative work focuses on enhancing the uniformity of deposition processes, which is crucial in various manufacturing applications.

Latest Patents

One of Jian-Xin Lei's key patents is titled "Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry." This invention features a multi-track magnetron with a convolute shape that is asymmetric about the target center around which it rotates. The design includes a plasma track formed as a closed loop between opposed inner and outer magnetic poles. The configuration is optimized to produce a cumulative track length distribution that conforms to the function L=ar. Through several iterations of computerized optimization, the pole shape is tested for sputtering uniformity, and adjustments are made to improve radial deposition uniformity while reducing azimuthal sidewall asymmetry.

Career Highlights

Jian-Xin Lei is currently employed at Applied Materials, Inc., where he continues to develop innovative technologies that enhance manufacturing processes. His work has led to advancements that are vital for industries relying on precise deposition techniques.

Collaborations

Throughout his career, Jian-Xin Lei has collaborated with esteemed colleagues such as Hong Sheng Yang and Tza-Jing Gung. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jian-Xin Lei's contributions to magnetron technology exemplify the importance of innovation in manufacturing processes. His patented inventions are paving the way for improved efficiency and uniformity in various applications.