Company Filing History:
Years Active: 2015-2018
Title: Innovations of Jian-Hua Li
Introduction
Jian-Hua Li is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of dielectric materials, holding a total of 6 patents. His work focuses on developing advanced materials with enhanced properties for various applications.
Latest Patents
One of Jian-Hua Li's latest patents is titled "Composite dielectric ceramic material having anti-reduction and high temperature stability characteristics and method for preparing same." This invention involves a composite dielectric ceramic material that includes a main component formulated from (1-x)(BaTiO)-x(BaLiTaO) and various oxide subcomponents. These subcomponents serve as sintering aids and improve dielectric stability, particularly enhancing the anti-reduction ability and increasing the coefficient of resistance. The interactions among these components significantly inhibit the rate of change of the temperature coefficient of capacitance (TCC) curve across a wide temperature range, while also improving the dielectric constant.
Another notable patent is for a "Ceramic capacitor dielectric material," which comprises BaTiO, BaZrO, SrTiO, MgCO, SiO, and at least one compound selected from transition and rare earth elements. This ceramic capacitor dielectric material exhibits a permittivity greater than 350 and a dielectric loss lower than 0.5%. It also demonstrates excellent performance under DC bias, fulfilling the X7T dielectric properties of the Electronic Industries Alliance (EIA).
Career Highlights
Jian-Hua Li has worked with notable companies such as Holy Stone Enterprise, Co., Ltd. and National Taipei University of Technology. His experience in these organizations has allowed him to further his research and development in dielectric materials.
Collaborations
Some of his coworkers include Sea-Fue Wang and Yuan-Cheng Lai, who have collaborated with him on various projects related to his patents and innovations.
Conclusion
Jian-Hua Li's contributions to the field of dielectric materials through his innovative patents highlight his expertise and dedication to advancing technology. His work continues to influence the development of high-performance materials in various applications.