Company Filing History:
Years Active: 1999-2001
Title: Innovations of Jia-Xiang Wang in Chemical Vapor Deposition
Introduction
Jia-Xiang Wang is a notable inventor based in San Jose, CA, who has made significant contributions to the field of chemical vapor deposition. He holds a total of 3 patents, showcasing his expertise and innovative spirit in developing advanced technologies for semiconductor manufacturing.
Latest Patents
Wang's latest patents include a high temperature, high flow rate chemical vapor deposition apparatus and related methods. This invention provides systems, methods, and apparatus for depositing titanium films at rates up to 200 Å/minute on semiconductor substrates from a titanium tetrachloride source. The invention features a ceramic heater assembly with an integrated RF plane for bottom powered RF capability, allowing PECVD deposition at a temperature of at least 400°C for more efficient plasma treatment. Additionally, a thermal choke isolates the heater from its support shaft, reducing the thermal gradient across the heater to minimize the risk of breakage and improve temperature uniformity. The deposition system incorporates a flow restrictor ring and other features that enable a 15 liters/minute flow rate through the chamber, which minimizes backside deposition and reduces the frequency of chamber cleanings.
Career Highlights
Jia-Xiang Wang is currently employed at Applied Materials, Inc., where he continues to innovate and develop cutting-edge technologies in the semiconductor industry. His work has significantly impacted the efficiency and effectiveness of chemical vapor deposition processes.
Collaborations
Wang has collaborated with notable coworkers such as Jun Zhao and Lee Luo, contributing to a dynamic and innovative work environment.
Conclusion
Jia-Xiang Wang's contributions to the field of chemical vapor deposition exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in semiconductor manufacturing and provide solutions that enhance efficiency and performance.