Ji Hye Han

Title: Ji Hye Han: Innovator in Graphene Technology

Introduction

Ji Hye Han is a prominent inventor based in Gongju-si, South Korea. She has made significant contributions to the field of graphene technology, particularly in the methods of deposition for large-area graphene layers. Her innovative approach has the potential to advance various applications in electronics and materials science.

Latest Patents

Ji Hye Han holds a patent for a "Method for depositing large-area graphene layer and apparatus for continuous graphene deposition." This patent describes a method that includes forming a titanium (Ti) layer on a substrate through sputtering. The process involves reducing the titanium layer by spraying a reductant gas containing hydrogen and a purge gas while moving in a specific direction relative to the substrate. Additionally, graphene is formed by spraying a reactant gas containing a graphene source in the opposite direction, allowing for efficient deposition.

Career Highlights

Ji Hye Han is currently associated with Kuk-il Graphene Co., Ltd., where she continues to develop her innovative techniques in graphene deposition. Her work has garnered attention for its potential to enhance the scalability and efficiency of graphene production.

Collaborations

Some of her notable coworkers include Dong Ho Yoon and Chul Kyu Song, who contribute to the collaborative efforts in advancing graphene technology at their company.

Conclusion

Ji Hye Han's contributions to graphene technology exemplify the innovative spirit of modern inventors. Her patented methods for graphene deposition are paving the way for future advancements in the field.