Ji-hun Park

Title: Ji-hun Park: Innovator in Etchant Composition Technology

Introduction

Ji-hun Park is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of etchant compositions used in manufacturing processes.

Latest Patents

Ji-hun Park holds a patent for an etchant composition and a method for manufacturing metal patterns and thin film transistor substrates. This innovative etchant composition is designed to effectively etch a multi-layered film of titanium and copper. The composition includes various components, such as persulfate, phosphoric acid, carbonyl ring compounds, nitrogen ring compounds, fluorine compounds, and zwitterionic compounds, all carefully balanced to achieve optimal performance.

Career Highlights

Ji-hun Park is currently employed at Samsung Display Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of manufacturing processes in the display technology sector.

Collaborations

Throughout his career, Ji-hun Park has collaborated with esteemed colleagues, including Bong-Kyun Kim and Changwoo Kwon. These partnerships have fostered innovation and contributed to the successful development of new technologies.

Conclusion

Ji-hun Park's contributions to etchant composition technology exemplify the impact of innovative thinking in the field of materials science. His work at Samsung Display Co., Ltd. and his collaborations with fellow inventors highlight the importance of teamwork in driving technological advancements.