Asan-si, South Korea

Ji-Hoon Shin


Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2020

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Ji-Hoon Shin: Innovator in Display Technology

Introduction

Ji-Hoon Shin is a prominent inventor based in Asan-si, South Korea. He has made significant contributions to the field of display technology, holding a total of 3 patents. His work focuses on enhancing the functionality and reliability of display substrates.

Latest Patents

One of Ji-Hoon Shin's latest patents is titled "Display substrate and method of repairing defects thereof." This innovative display substrate includes a gate metal pattern with a gate line extending in a first direction, a gate electrode connected to the gate line, and a storage line. Additionally, it features a data metal pattern with a data line extending in a second direction that crosses the first direction. The design includes a source electrode connected to the data line and a drain electrode spaced apart from the source electrode. A repair electrode extends in the second direction and overlaps the storage line. An organic layer is disposed on the data metal pattern, and a pixel electrode is placed on the organic layer, electrically connected to the drain electrode.

Career Highlights

Ji-Hoon Shin is currently employed at Samsung Display Co., Ltd., where he continues to push the boundaries of display technology. His work has been instrumental in developing advanced display substrates that improve performance and durability.

Collaborations

Throughout his career, Ji-Hoon Shin has collaborated with notable colleagues, including Hong-Beom Lee and Ho-Yong Shin. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Ji-Hoon Shin is a key figure in the advancement of display technology, with a focus on innovative solutions for display substrates. His contributions and collaborations continue to shape the future of this field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…