Jeoren K J Van Duren

Title: Innovations of Jeoren K J Van Duren in Semiconductor Technology

Introduction

Jeoren K J Van Duren is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to high-throughput printing methods.

Latest Patents

Van Duren holds a patent for "High-throughput printing of semiconductor precursor layer from inter-metallic microflake particles." This patent describes methods and devices for efficiently printing semiconductor precursor layers using microflake particles. The method involves transforming precursor materials into dispersions of planar particles, which maintain stoichiometric ratios even after settling. This innovation allows for the creation of denser coatings that can anneal into fused films at lower temperatures and times compared to traditional spherical nanoparticles. The resulting dense films are particularly advantageous for photovoltaic devices.

Career Highlights

Jeoren K J Van Duren is associated with Nanosolar, Inc., where he applies his expertise in semiconductor technologies. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Matthew R Robinson and Brian M Sager, contributing to advancements in the field through teamwork and shared expertise.

Conclusion

Jeoren K J Van Duren's innovative work in semiconductor technology, particularly through his patent on high-throughput printing methods, showcases his significant impact on the industry. His contributions continue to influence the development of efficient semiconductor devices.