Company Filing History:
Years Active: 2025
Title: Jeong Du Kim: Innovator in Extreme Ultraviolet Lithography
Introduction
Jeong Du Kim is a prominent inventor based in Seoul, South Korea. He is known for his significant contributions to the field of semiconductor technology. His innovative work has led to advancements in extreme ultraviolet (EUV) lithography, which is crucial for the fabrication of modern semiconductor devices.
Latest Patents
Jeong Du Kim holds a patent for an EUV generator, which includes an EUV lithography apparatus and a method for fabricating semiconductor devices using the same. This patent describes an extreme ultraviolet light generator that features a collector with a first and second focus. It also includes a droplet feeder that provides a source droplet toward the first focus of the collector, a laser generator that irradiates a laser toward the first focus, and an airflow controller with a ring shape that has at least one slit. The design incorporates a control gas feeder that supplies control gas towards the slit of the airflow controller. This innovative technology is essential for enhancing the efficiency and precision of semiconductor manufacturing.
Career Highlights
Jeong Du Kim is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His role at Samsung has allowed him to work on cutting-edge technologies that push the boundaries of semiconductor fabrication. His expertise in EUV lithography has positioned him as a key player in the industry.
Collaborations
Jeong Du Kim collaborates with fellow inventor Hyeon Jin Kim, contributing to advancements in semiconductor technology. Their partnership exemplifies the importance of teamwork in driving innovation within the field.
Conclusion
Jeong Du Kim's contributions to the field of semiconductor technology, particularly through his patent on EUV lithography, highlight his role as a leading inventor. His work at Samsung Electronics Co., Ltd. continues to influence the future of semiconductor manufacturing.