Jennifer Lewis

Title: Innovations by Jennifer Lewis in Semiconductor Technology

Introduction

Jennifer Lewis is an accomplished inventor based in Littleton, CO (US). She has made significant contributions to the field of semiconductor technology, particularly through her innovative patent that addresses the measurement of etch uniformity in semiconductor wafers.

Latest Patents

Jennifer holds a patent for a "Method and apparatus for measuring etch uniformity of a semiconductor wafer." This invention provides a method and apparatus for performing in situ measurement of etch uniformity within a semiconductor wafer processing system. The apparatus analyzes optical emission spectroscopy (OES) data produced by an OES system. The analysis computes the first derivative of the OES data as it is acquired. When the data meets a specific trigger criterion, the value of the first derivative is correlated with a particular uniformity value. Consequently, the system produces a uniformity value for a semiconductor wafer using an in situ measurement technique. This patent showcases her expertise and innovative approach in the semiconductor industry, with a total of 1 patent to her name.

Career Highlights

Jennifer is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. Her work at Applied Materials has allowed her to further develop her skills and contribute to advancements in semiconductor technology.

Collaborations

Throughout her career, Jennifer has collaborated with talented professionals, including Melisa J Buie and Leonid Poslavsky. These collaborations have enriched her work and fostered innovation in her projects.

Conclusion

Jennifer Lewis is a notable inventor whose work in semiconductor technology has made a significant impact. Her innovative patent for measuring etch uniformity demonstrates her expertise and commitment to advancing the field.