Company Filing History:
Years Active: 2008
Title: **Innovative Contributions of Jeng-Chang Yang in Phenolic Resin Technology**
Introduction
Jeng-Chang Yang, an inventor based in Longtan, Taiwan, has made significant strides in the field of phenolic resin technology. With a keen focus on improving material toughness, his work has the potential to impact various industrial applications.
Latest Patents
Yang holds a patent for a "Toughness-increased phenolic resin and preparation thereof." This innovative phenolic resin incorporates polydimethylsiloxane as a coupling agent, resulting in enhanced toughness and thermal stability. The process begins by modifying phenolic resin with γ-glycidoxypropyltrimethoxysilane, which improves compatibility with polydimethylsiloxane. Subsequently, tetraethoxysilane is added to facilitate hydrolysis condensation, yielding a superior product that meets industry demands for durability.
Career Highlights
Currently, Jeng-Chang Yang is affiliated with the Chung Shan Institute of Science and Technology, a research institution known for its contributions to scientific and technological advancements. His career is marked by a commitment to innovation and the development of advanced materials.
Collaborations
Throughout his career, Yang has collaborated with notable colleagues such as Chen-Chi Martin Ma and Hon-Bin Chen. These collaborations have fostered an environment of shared knowledge and creativity, contributing to the successful development of new technologies and patented inventions.
Conclusion
Jeng-Chang Yang's contributions to the field of phenolic resins exemplify the importance of innovation in material science. His patented work not only addresses industry challenges but also paves the way for future advancements in resin technology.