Jen-Chwen Lin

Title: The Innovations of Jen-Chwen Lin

Introduction

Jen-Chwen Lin is an accomplished inventor based in Atlanta, GA. He has made significant contributions to the field of capacitor technology, particularly through his innovative designs and methods. His work has led to advancements that enhance the performance and efficiency of electronic devices.

Latest Patents

One of Jen-Chwen Lin's notable patents is for "Planar high-density aluminum capacitors for stacking and embedding." This patent describes multi-terminal capacitor devices and methods of making these devices. The multi-terminal capacitor devices may include a plurality of individual capacitors arranged in a single device layer, such as high surface area capacitors. Each individual capacitor may consist of an aluminum foil-based electrode, an aluminum oxide dielectric layer conformal with the aluminum foil-based electrode, and a conductive material electrode, such as a conducting polymer or a conductive ceramic, in conformal contact with the dielectric layer. This innovation represents a significant step forward in capacitor technology.

Career Highlights

Jen-Chwen Lin is currently associated with Saras Micro Devices, Inc., where he continues to develop cutting-edge technologies. His expertise in capacitor design has positioned him as a key player in the industry. With a patent portfolio that includes 1 patent, he has demonstrated his ability to innovate and contribute to advancements in electronic components.

Collaborations

Throughout his career, Jen-Chwen Lin has collaborated with talented individuals such as Venkatesh Sundaram and Markondeyaraj Pulugurtha. These collaborations have fostered an environment of creativity and innovation, leading to the development of new technologies.

Conclusion

Jen-Chwen Lin's contributions to capacitor technology exemplify the spirit of innovation in the field of electronics. His work not only enhances the performance of devices but also paves the way for future advancements.