Jeffrey S Kollodge

Title: The Innovative Contributions of Jeffrey S. Kollodge

Introduction

Jeffrey S. Kollodge is a notable inventor based in Stillwater, MN (US), recognized for his significant contributions to the field of abrasive technology. With a total of 8 patents, he has made remarkable advancements that enhance the efficiency and effectiveness of polishing processes.

Latest Patents

Kollodge's latest patents include innovative structured fixed abrasive articles that incorporate surface-treated nano-ceria filler. These articles consist of a multiplicity of three-dimensional abrasive composites, which include ceria abrasive particles with a volume mean diameter ranging from 100 to 500 nanometers (nm). The matrix material of these composites features a polymeric binder and a variety of surface-treated ceria filler particles with a volume mean diameter of less than 100 nm. Additionally, he has developed polishing fluids and methods for chemical mechanical planarization (CMP), which utilize a synergistic mixture of water, an oxidizing agent, a complexing agent, and metal ions to modify surfaces, particularly semiconductor wafers.

Career Highlights

Kollodge is currently associated with 3M Innovative Properties Company, where he continues to push the boundaries of abrasive technology. His work has been instrumental in developing products that improve surface planarization techniques, which are crucial in semiconductor manufacturing.

Collaborations

Throughout his career, Kollodge has collaborated with esteemed colleagues such as Robert P. Messner and Julie Y. Qian. These partnerships have fostered a collaborative environment that enhances innovation and drives the development of new technologies.

Conclusion

Jeffrey S. Kollodge's contributions to abrasive technology and his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in polishing processes and materials.