Jeffrey S Armfield

Title: Innovations of Jeffrey S Armfield in Plasma Technology

Introduction

Jeffrey S Armfield is a notable inventor based in Ypsilanti, MI (US). He has made significant contributions to the field of plasma technology, particularly in the area of exhaust gas aftertreatment. With a total of 2 patents, his work focuses on enhancing catalyst reactivity through innovative methods.

Latest Patents

Armfield's latest patents include a method for generating a highly reactive plasma for exhaust gas aftertreatment. This method involves non-thermal plasma aftertreatment of exhaust gases, which comprises providing short risetime, high frequency, high power bursts of low-duty factor microwaves. These bursts are sufficient to generate a plasma discharge, allowing the gas to be treated through the discharge. This process causes dissociative reduction of the exhaust gases and enhances catalyst reactivity by applying pulsed microwave fields directly to the catalyst material. The invention also includes a reactor designed for aftertreatment of exhaust gases. Another patent focuses on generating a highly reactive plasma using a dielectric barrier discharge, which also facilitates the dissociative reduction of exhaust gases.

Career Highlights

Armfield is associated with the United States of America as represented by the Department of Energy. His work has been instrumental in advancing technologies that address environmental concerns related to exhaust emissions.

Collaborations

He has collaborated with notable coworkers such as Gregory Richard Hanson and John M Storey, contributing to the development of innovative solutions in plasma technology.

Conclusion

Jeffrey S Armfield's contributions to plasma technology and exhaust gas aftertreatment demonstrate his commitment to innovation and environmental sustainability. His patents reflect a deep understanding of the complexities involved in enhancing catalyst reactivity through advanced methods.