Jeffrey Putney

Title: Inventor Profile: Jeffrey Putney from Champaign, IL

Introduction

Jeffrey Putney is an innovative inventor based in Champaign, Illinois, recognized for his contributions to the field of microplasma technology. With one patent to his name, Putney has developed a groundbreaking solution that enhances the efficiency of plasma lamps.

Latest Patents

Putney's patent, titled "Variable Electric Field Strength Metal and Metal Oxide Microplasma Lamps and Fabrication," describes preferred embodiments involving microcavity plasma lamps. These lamps incorporate multiple metal and metal oxide layers that define various arrays of microcavities, along with encapsulated thin metal electrodes. The unique packaging encloses these layers within a plasma medium while allowing for the variation of electric field strength and total gas pressure (E/p). Furthermore, his invention outlines advanced methods to manufacture these lamps by simultaneously evacuating the volume within the packaging and the surrounding area, maintaining an insignificant or zero pressure differential across the packaging.

Career Highlights

Jeffrey Putney has built a notable career at the University of Illinois, where he is actively engaged in research and development. His work primarily focuses on advanced plasma technologies, contributing to the understanding and advancement of microplasma applications.

Collaborations

Throughout his career, Jeffrey Putney has collaborated with reputable colleagues such as J. Gary Eden and Sung-Jin Park. These partnerships have fostered innovation and have led to significant advancements in plasma technology.

Conclusion

With his inventive work on variable electric field strength metal and metal oxide microplasma lamps, Jeffrey Putney stands out as a pivotal figure in plasma technology research at the University of Illinois. His dedication to innovation not only advances the field but also showcases the potential for further developments in microplasma applications.