Company Filing History:
Years Active: 2016
Title: The Innovations of Jeffrey Jm Hastie
Introduction
Jeffrey Jm Hastie is a notable inventor based in Kingston, Canada. He has made significant contributions to the field of metal deposition through his innovative patent. His work focuses on the development of precursor compounds that are essential for the deposition of metals on various substrates, particularly in microelectronics.
Latest Patents
Hastie's most recent patent is titled "Group 11 mono-metallic precursor compounds and use thereof in metal deposition." This patent provides valuable precursor compounds that facilitate the deposition of group metals, such as copper, silver, or gold, on substrates. The compounds are characterized by a diaminocarbene (DAC) structure, which plays a crucial role in the synthesis and application of these materials in microelectronic devices.
Career Highlights
Jeffrey Jm Hastie has been associated with Greencentre Canada, where he has applied his expertise in developing innovative solutions for metal deposition. His work has contributed to advancements in microelectronic device structures, enhancing the efficiency and effectiveness of metal deposition methods.
Collaborations
Hastie has collaborated with notable colleagues, including Sean T Barry and Jason Coyle, to further his research and development efforts. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.
Conclusion
Jeffrey Jm Hastie's contributions to the field of metal deposition through his innovative patent demonstrate his commitment to advancing technology in microelectronics. His work continues to influence the industry and pave the way for future innovations.