Jeffrey F Hanson

Title: The Innovations of Jeffrey F. Hanson

Introduction

Jeffrey F. Hanson is a notable inventor based in Austin, TX, who has made significant contributions to the field of semiconductor technology. His work primarily focuses on improving processes that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Hanson holds a patent for a method of chemical mechanical polishing a semiconductor device. This innovative process involves the formation of conductive plugs in a semiconductor device using a chemical mechanical polishing (CMP) technique. The method includes depositing a blanket conductive layer, such as tungsten, in a plug opening and polishing it back using a slurry that consists of copper sulfate or copper perchlorate along with an abrasive like alumina or silica. This patent represents a crucial advancement in semiconductor manufacturing.

Career Highlights

Throughout his career, Jeffrey F. Hanson has been associated with Motorola Corporation, where he has contributed to various projects and innovations in semiconductor technology. His expertise in chemical mechanical polishing has positioned him as a valuable asset in the industry.

Collaborations

Hanson has worked alongside talented colleagues, including Chris C. Yu and Jeffrey L. Klein, who have also made significant contributions to the field. Their collaborative efforts have further advanced the technology and processes within the semiconductor industry.

Conclusion

Jeffrey F. Hanson is a distinguished inventor whose work in semiconductor technology has led to important advancements in the field. His patent for a method of chemical mechanical polishing showcases his innovative approach and dedication to improving semiconductor manufacturing processes.