Location History:
- Scotia, NY (US) (1986 - 2000)
- Glennville, NY (US) (2009)
- Glenville, NY (US) (2010 - 2017)
Company Filing History:
Years Active: 1986-2017
Title: Innovations by Jeffrey D. Sheaffer
Introduction
Jeffrey D. Sheaffer is a notable inventor based in Scotia, NY (US). He has made significant contributions to the field of electrical engineering, particularly in the development of materials used in dynamoelectric machines. With a total of 7 patents to his name, Sheaffer continues to push the boundaries of innovation.
Latest Patents
Among his latest patents is an "Electrically insulating composition used in conjunction with dynamoelectric machines." This composition comprises about 25 to about 55 percent by weight of filler materials and about 45 to about 75 percent by weight of resin. The percentages are selected such that the total percentage of components does not exceed 100 percent. Notably, this composition has a thermal conductivity of about 0.2 to about 1.3 W/m-K when measured at 130°C. Another significant patent is for "Stator bar components with high thermal conductivity." This stator bar includes a number of conductors and an insulation layer positioned around the conductors, with the insulation layer incorporating a ceramic component.
Career Highlights
Jeffrey D. Sheaffer is currently employed at General Electric Company, where he applies his expertise in electrical engineering to develop innovative solutions. His work has been instrumental in enhancing the performance and efficiency of electrical components.
Collaborations
Throughout his career, Sheaffer has collaborated with notable colleagues, including Mark Markovitz and David John Wardell. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Jeffrey D. Sheaffer exemplifies the spirit of innovation in electrical engineering through his patents and contributions to General Electric Company. His work continues to influence the industry and pave the way for future advancements.