Foster City, CA, United States of America

Jeffrey D Chin


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2002-2012

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2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Jeffrey D. Chin

Introduction

Jeffrey D. Chin, an accomplished inventor based in Foster City, California, has made significant contributions to the fields of material science and chemical engineering. With two patents to his name, his work focuses on the development of advanced materials and methods that have a wide range of applications in electronics and biology.

Latest Patents

1. **Articles with Super-Hydrophobic and/or Super-Hydrophilic Surfaces and Method of Formation**

This invention revolves around a chemical vapor deposition method designed to create layers of materials that exhibit super-hydrophilic or super-hydrophobic properties. The patent not only addresses the formation of these surfaces but also explores their electronic applications and potential biological uses.

2. **High Etch Rate Method for Plasma Etching Silicon Nitride**

This invention presents a novel approach for the rapid plasma etching of challenging materials, specifically targeting silicon nitride layers that exceed five microns in thickness. The method involves the use of two plasma sources — an etchant gas and a sputtering gas — which can be finely adjusted to achieve remarkable etch rates exceeding two microns per minute. A two-step etching process is also introduced, combining high and low etch rates to enhance efficiency while protecting underlying layers.

Career Highlights

Throughout his career, Jeffrey has been associated with notable companies, including Applied Microstructures, Inc. and Applied Materials, Inc. These positions have allowed him to leverage his expertise in material sciences and contribute to groundbreaking projects that have shaped the industry.

Collaborations

Jeffrey has collaborated with prominent colleagues such as Boris Kobrin and Benigno A. Janeiro. These partnerships have been instrumental in his innovative endeavors, fostering a shared environment of creativity and technological advancement.

Conclusion

Jeffrey D. Chin's innovative work and patented inventions reflect a dedicated pursuit of excellence in material sciences. His contributions pave the way for advancements in various applications, demonstrating the significant impact of his inventions in modern technology. As he continues to push the boundaries of what is possible, Jeffrey stands as an inspiring figure for aspiring inventors in the field.

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