Company Filing History:
Years Active: 2003-2006
Title: The Innovations of Jeffrey A. Albelo
Introduction
Jeffrey A. Albelo is a notable inventor based in Hillsboro, OR (US), recognized for his contributions to the field of photomask technology. With a total of 4 patents, his work focuses on enhancing the stability and shelf life of photomask substrates, which are critical in the semiconductor manufacturing process.
Latest Patents
Albelo's latest patents include innovative methods aimed at increasing the shelf life of photomask substrates. One significant patent describes a method of increasing the shelf life of a photomask substrate by overcoating a chemically amplified photoresist with a protective topcoat. This topcoat is pH adjusted to be as neutral as possible, which improves the stability of the photoresist during the lengthy direct writing process. Another patent outlines a method for optically fabricating a photomask using a direct write continuous wave laser, detailing a series of steps that include applying an organic antireflection coating and post-exposure baking of the DUV photoresist.
Career Highlights
Jeffrey A. Albelo is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop and patent innovative solutions that address critical challenges in photomask production.
Collaborations
Throughout his career, Albelo has collaborated with notable colleagues, including Melvin Warren Montgomery and Scott Edward Fuller. These collaborations have contributed to the advancement of technologies in the field of photomasks.
Conclusion
Jeffrey A. Albelo's contributions to photomask technology through his patents and work at Applied Materials, Inc. highlight his significant role in the semiconductor industry. His innovative methods continue to enhance the efficiency and reliability of photomask substrates.