Jeff Lorelli

Title: Jeff Lorelli: Innovator in Gas Treatment Technologies

Introduction

Jeff Lorelli is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of gas treatment technologies, particularly in the area of effluent gas streams. His innovative approach addresses the challenges associated with the abatement of undesired components in gas streams.

Latest Patents

Jeff Lorelli holds a patent for a "Method for point-of-use treatment of effluent gas streams." This system is designed to abate undesired components, such as halocompounds, acid gases, silanes, and ammonia, from gas streams. The method involves scrubbing the effluent gas stream with an aqueous scrubbing medium. Notably, halocompounds like fluorine and chlorofluorocarbons can be effectively scrubbed in the presence of reducing agents such as sodium thiosulfate. The scrubbing system includes a first acid gas scrubbing unit operated in cocurrent gas/liquid flow and a second polishing unit operated in countercurrent gas/liquid flow. This design achieves high removal efficiency with low water consumption. The abatement system is particularly useful in treating semiconductor manufacturing process effluents. Jeff Lorelli has 1 patent to his name.

Career Highlights

Jeff Lorelli is associated with Advanced Technology Materials, Inc., where he applies his expertise in gas treatment technologies. His work has contributed to advancements in environmental technology and semiconductor manufacturing processes.

Collaborations

Throughout his career, Jeff has collaborated with notable colleagues, including Jose I Arno and Mark R Holst. These collaborations have further enhanced the development of innovative solutions in gas treatment.

Conclusion

Jeff Lorelli's contributions to the field of gas treatment technologies demonstrate his commitment to innovation and environmental sustainability. His patented methods provide effective solutions for managing effluent gas streams, particularly in the semiconductor industry.