Company Filing History:
5 out of 13,741 
1 out of 832,912 Years Active: 2002-2005
Title: The Innovative Contributions of Jed Davidow
Introduction
Jed Davidow is a notable inventor based in Santa Clara, CA (US), recognized for his significant contributions to technology and process monitoring. With a total of 6 patents to his name, Davidow has developed innovative methods that enhance the efficiency and accuracy of various processes.
Latest Patents
Among his latest patents is a method and apparatus for monitoring a process by employing principal component analysis. This invention provides a systematic approach to monitor production processes by measuring correlated attributes and performing principal component analysis to generate production principal components. These components are then compared to calibration principal components derived from a calibration process, ensuring optimal monitoring and control.
Another significant patent by Davidow focuses on film thickness control using spectral interferometry. This process is particularly useful in substrate processing operations, such as plasma etching. By utilizing plasma emissions as a broadband light source, the method measures various wavelengths of radiation reflected from the wafer's surface. These measurements are analyzed using pattern recognition techniques, including principal component analysis and neural net pattern recognition, to enhance the precision of the etching process.
Career Highlights
Davidow has worked with prominent companies in the technology sector, including Applied Materials, Inc. His experience in these organizations has contributed to his expertise in developing innovative solutions for complex engineering challenges.
Collaborations
Throughout his career, Davidow has collaborated with talented professionals, including Moshe Sarfaty and Dimitris Lymberopoulos. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Jed Davidow's contributions to the field of process monitoring and substrate processing are noteworthy. His innovative patents reflect a commitment to advancing technology and improving operational efficiencies. Davidow's work continues to influence the industry and inspire future innovations.