Jean S Deslauriers

Title: The Innovations of Jean S Deslauriers

Introduction

Jean S Deslauriers is a notable inventor based in Bromont, Canada. He has made significant contributions to the field of technology, particularly in the development of devices that utilize tantalum silicide structures. With a total of two patents to his name, Deslauriers has demonstrated his expertise and innovative spirit in the industry.

Latest Patents

Deslauriers' latest patents include methods for fabricating devices that incorporate tantalum silicide structures. One patent details a method that is essentially free of conductive etch residues. This method involves depositing tantalum and silicon onto a substrate, patterning the materials, and then sintering them to create a patterned layer of tantalum silicide. Another patent focuses on reactive ion etching of tantalum and silicon, further enhancing the fabrication process of these advanced devices.

Career Highlights

Throughout his career, Deslauriers has worked with prestigious organizations such as AT&T Bell Laboratories and American Telephone and Telegraph Company. His experience in these companies has allowed him to refine his skills and contribute to groundbreaking technological advancements.

Collaborations

Deslauriers has collaborated with various professionals in his field, including Hyman J Levinstein. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Jean S Deslauriers is a distinguished inventor whose work in tantalum silicide structures has made a lasting impact on technology. His patents reflect his commitment to innovation and excellence in the field.