Saint Egreve, France

Jean-Luc Tissot



Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1992-2010

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Jean-Luc Tissot

Introduction

Jean-Luc Tissot is a notable inventor based in Saint Egreve, France. He has made significant contributions to the field of technology, particularly in the development of advanced detection systems and manufacturing processes. With a total of 2 patents to his name, Tissot's work reflects a commitment to innovation and practical applications.

Latest Patents

Tissot's latest patents include an infrared radiation detector and a driving or piloting assistance device that incorporates such a detector. The infrared radiation detector features an assembly of elementary sensors capable of detecting radiation, which includes at least two separate detection areas. Each area comprises sensors with different thermal time constants, enhancing the detector's functionality. His second patent describes an assembly of parts forming an angle between them, along with a process for producing this assembly. This invention involves contact elements or pads that connect parts using a low melting point metallic soldering material, specifically designed for applications in mirror manufacturing.

Career Highlights

Throughout his career, Jean-Luc Tissot has worked with prominent organizations, including the Commissariat à l'Énergie Atomique and Ulis. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking projects in the field of technology.

Collaborations

Tissot has collaborated with notable colleagues such as Francois Marion and Michel Ravetto. These partnerships have likely enriched his work and fostered a collaborative environment for innovation.

Conclusion

Jean-Luc Tissot's contributions to technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in detection systems and manufacturing processes.

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