Company Filing History:
Years Active: 2024
Title: Innovations of Jean Luc D Dufour
Introduction
Jean Luc D Dufour is a notable inventor based in Greensburg, PA (US). He has made significant contributions to the field of milling tools, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of cutting inserts used in various applications.
Latest Patents
One of his latest patents involves cutting inserts designed for use in milling tools. These cutting inserts feature four cutting edges and are installed in pockets on a rotatable cutting tool holder. The design includes a front face, a rear face, and four side faces that connect the two. Each cutting edge is formed at the intersection of the front face and each side face. The cutting edges consist of multiple segments, including a facet cutting edge that creates a flat surface on the workpiece being milled, and a straight lead cutting edge that extends at an angle from the facet cutting edge. This lead cutting edge angle is specifically chosen to optimize the milling process at the entry point. Additionally, the cutting inserts are designed with side seating surfaces that provide more stable support within the cutting insert pockets.
Career Highlights
Jean Luc D Dufour is currently employed at Kennametal Inc., a company renowned for its innovative solutions in tooling and materials. His work at Kennametal has allowed him to further develop his expertise in cutting technologies and contribute to advancements in the industry.
Collaborations
Throughout his career, Jean Luc has collaborated with various professionals, including his coworker Gilles Festeau. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.
Conclusion
Jean Luc D Dufour's contributions to the field of milling tools through his patents and work at Kennametal Inc. highlight his commitment to innovation. His advancements in cutting insert technology continue to influence the industry positively.