Jean-Francois Million-Brodaz

Title: Inventor Profile: Jean-Francois Million-Brodaz

Introduction

Jean-Francois Million-Brodaz is a notable inventor based in Chambery, France, recognized for his contributions to the field of materials science. With a focus on innovative deposition processes, Million-Brodaz holds a patent that enhances the fabrication of semiconductor devices.

Latest Patents

The primary patent held by Million-Brodaz is titled "Selective Deposition Process of a Refractory Metal Silicide onto Silicon." This invention outlines a method for depositing a metal silicide onto silicon wafers that are partially coated with silicon dioxide. The process involves a two-step heating technique within a cold-wall airtight chamber, facilitating controlled deposition based on specific gaseous compositions and temperature profiles.

Career Highlights

Jean-Francois Million-Brodaz is associated with the French National Centre for Scientific Research (CNRS). His innovative work on selective deposition processes has significant implications for semiconductor technology, enhancing the precision and efficiency of manufacturing techniques employed in the electronics industry.

Collaborations

Throughout his career, Million-Brodaz has collaborated with fellow researchers Joaquim Torres and Roland Madar. These partnerships have fostered a dynamic research environment, contributing to advancements in material deposition and semiconductor fabrication.

Conclusion

Jean-Francois Million-Brodaz's work exemplifies the spirit of innovation in materials science. His patent on the selective deposition process not only highlights his ingenuity but also contributes to the ongoing evolution of semiconductor technologies. Through his collaboration with esteemed colleagues, Million-Brodaz continues to shape the future of the industry, paving the way for new advancements in fabrication techniques.