Jean-Francedillaois Daviet

Title: Innovations of Jean-Francedillaois Daviet

Introduction

Jean-Francedillaois Daviet is a notable inventor based in Cran-Gevrier, France. He has made significant contributions to the field of semiconductor processing through his innovative patents. His work focuses on enhancing the efficiency and control of plasma reactors used in semiconductor manufacturing.

Latest Patents

One of Daviet's key patents is titled "Thin film electrostatic shield for inductive plasma processing." This invention describes a plasma reactor and methods for processing semiconductor substrates. The technology involves an induction coil that inductively couples power into the reactor to produce a plasma. A thin electrostatic shield is strategically placed between the induction coil and the plasma to reduce capacitive coupling. This design allows inductive power to pass through the shield while substantially attenuating capacitive coupling. As a result, the modulation of the plasma potential relative to the substrate is reduced, enabling more controllable processing.

Career Highlights

Jean-Francedillaois Daviet is currently associated with CTP GmbH, where he continues to develop innovative solutions in the field of plasma processing. His expertise and inventions have contributed to advancements in semiconductor technology, making him a valuable asset in the industry.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Jean-Francedillaois Daviet's contributions to the field of semiconductor processing through his innovative patents highlight his role as a significant inventor. His work continues to influence the industry and improve the efficiency of plasma reactors.