Jayaram Krishnaswamy

Title: Innovations by Jayaram Krishnaswamy

Introduction

Jayaram Krishnaswamy is a notable inventor based in Raleigh, NC (US). He has made significant contributions to the field of electron beam technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

His latest patents include a process for large area hardening of photoresists or polymer films using a wide area soft vacuum abnormal glow electron beam discharge. This process utilizes a short duration pulsed electron beam produced in soft vacuum conditions, which interacts with the patterned photoresist or polymer resist to stabilize the patterns through electron-induced cross-linking. Additionally, he has developed a soft vacuum electron beam patterning apparatus that employs a cold cathode glow discharge electron gun. This apparatus produces a wide area collimated electron beam for flood exposure of thin film materials, allowing for spatially localized exposure and patterning.

Career Highlights

Jayaram Krishnaswamy is currently associated with Applied Electron Corporation, where he continues to advance his research and development efforts in electron beam technologies. His work has been instrumental in enhancing the capabilities of electron beam patterning and hardening processes.

Collaborations

He collaborates with various professionals in the field, including his coworker George J Collins, to further innovate and refine electron beam applications.

Conclusion

Jayaram Krishnaswamy's contributions to electron beam technology through his patents and work at Applied Electron Corporation highlight his role as a significant inventor in this specialized field. His innovative processes are paving the way for advancements in material hardening and patterning techniques.