Jay M Brown

Title: The Innovative Contributions of Jay M Brown

Introduction

Jay M Brown is a notable inventor based in Denison, Texas. He has made significant contributions to the field of optical lithography, holding a total of 3 patents. His work has been instrumental in advancing technologies that utilize photolithographic techniques.

Latest Patents

Among his latest patents is a photolithographic technique and illuminator using real-time addressable technology. This phase shift illuminator consists of a light source and a phase modulator, typically a flexure beam micromirror array, which transversely modulates the incident light beam. The use of a polarizing beam splitter and a quarter-wave plate allows for the separation of incident and reflected light beams. The phase-modulated light beam can be utilized in optical lithography by passing it through a lithography mask and focusing it onto a target wafer.

Another significant patent involves a method of exposing a light-sensitive material. Similar to his previous work, this phase shift illuminator comprises a light source and a phase modulator. The technology aims to enhance the efficiency and precision of optical lithography processes.

Career Highlights

Jay M Brown is currently employed at Texas Instruments Corporation, where he continues to innovate and develop new technologies. His expertise in optical systems has made him a valuable asset to the company.

Collaborations

Throughout his career, Jay has collaborated with talented individuals such as Tsen-Hwang Lin and Shane R Palmer. These partnerships have fostered an environment of creativity and innovation, leading to groundbreaking advancements in their field.

Conclusion

Jay M Brown's contributions to optical lithography and photolithographic techniques have established him as a prominent figure in the field. His patents reflect a commitment to innovation and excellence, paving the way for future advancements in technology.