Jason J Keleher

Title: Jason J Keleher: Innovator in Semiconductor Technology

Introduction

Jason J Keleher is a notable inventor based in Schenectady, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of chemical-mechanical planarization (CMP). With a total of 2 patents, Keleher's work has advanced the processes used in semiconductor manufacturing.

Latest Patents

Keleher's latest patents focus on the development of diamond slurry for chemical-mechanical planarization of semiconductor wafers. The first patent describes a multistage process for CMP of copper (Cu), which begins with forming a primary aqueous or non-aqueous slurry. This slurry consists of various components, including oxidizers, chelating agents, surfactants, and diamond particles, all carefully balanced to achieve optimal pH levels. The semiconductor wafer undergoes CMP using this primary slurry, followed by a cleaning operation. The process is then repeated with a secondary aqueous slurry that also includes diamond particles and pH adjustment agents, ensuring thorough cleaning and effective planarization.

Career Highlights

Keleher is currently employed at General Electric Company, where he continues to innovate in semiconductor technologies. His work has been instrumental in improving the efficiency and effectiveness of CMP processes, which are critical in the production of high-quality semiconductor devices.

Collaborations

Some of Keleher's notable coworkers include Yuzhuo Li and David B Cerutti. Their collaborative efforts contribute to the advancement of semiconductor manufacturing techniques.

Conclusion

Jason J Keleher is a prominent figure in the semiconductor industry, with a focus on enhancing chemical-mechanical planarization processes. His innovative patents and contributions to General Electric Company highlight his commitment to advancing technology in this critical field.