Company Filing History:
1 out of 8 
1 out of 832,812 Years Active: 2002-2004
Title: The Innovative Mind of Jörg Butschke
Introduction
Jörg Butschke, an accomplished inventor based in Stuttgart, Germany, has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, Butschke continues to innovate, focusing on advancements in ion projection lithography and membrane mask fabrication.
Latest Patents
Jörg Butschke's most recent patents showcase his expertise in the production of large-area membrane masks. His first patent, titled "Large-area membrane mask and method for fabricating the mask," addresses the need for increased rigidity in membrane masks used for ion projection lithography. By utilizing a second wafer made from the same material as the membrane layer, he innovatively centers the membrane area between two carrying rings, enhancing its overall stability.
In his second patent, "Method of producing large-area membrane masks," Butschke offers inventive methods designed to prevent excessive mechanical strain on the components during production. His techniques involve careful steps for stripping the semiconductor support layer, ensuring durability and effectiveness in the manufacturing process.
Career Highlights
Throughout his career, Jörg Butschke has worked at prominent institutions, including the Institut für Mikroelektronik Stuttgart, where he further honed his skills and contributed to the advancement of microelectronics. His work has positioned him as a key figure in the development of innovative technologies within the semiconductor industry.
Collaborations
Butschke has collaborated with notable colleagues, including Florian Letzkus and Hans Löschner. These partnerships have allowed him to explore new ideas and enhance the quality of his inventions, fostering a creative environment that encourages innovation and excellence.
Conclusion
Jörg Butschke is a pioneering inventor whose work on membrane masks has made significant impacts in the field of ion projection lithography. With his groundbreaking patents and collaborative spirit, Butschke continues to push the boundaries of technology, paving the way for future advancements in semiconductor manufacturing.