Company Filing History:
Years Active: 1992
Title: Jan Van Eljk - Innovator in Lithographic Technology
Introduction
Jan Van Eljk is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography, particularly in the design of devices used for semiconductor manufacturing. His innovative approach has led to the development of a unique lithographic device that enhances the efficiency and accessibility of semiconductor patterning.
Latest Patents
Jan Van Eljk holds a patent for a lithographic device with a suspended object table. This device features a lithographic irradiation system that is securely mounted to a frame. The design includes a positioning device that allows for the displacement of an object table beneath the irradiation system. The device is engineered for compactness and ease of maintenance, as it can be rotated to an end position for accessibility. This innovation is particularly useful for irradiating semiconductor substrates, enabling precise imaging of semiconductor patterns.
Career Highlights
Jan Van Eljk is associated with U.S. Philips Corporation, where he has contributed to advancements in lithographic technology. His work has been instrumental in improving the manufacturing processes for semiconductors, which are critical components in modern electronics. His patent reflects his expertise and commitment to innovation in this field.
Collaborations
Jan has collaborated with notable colleagues, including Dominicus J Franken and Fransiscus Mathijs Jacobs. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Jan Van Eljk's contributions to lithographic technology exemplify the spirit of innovation in the semiconductor industry. His patented device not only enhances operational efficiency but also sets a standard for future developments in the field.