Dresden, Germany

Jan Räbiger


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Jan Räbiger: Innovator in Chemical Mechanical Polishing Technology

Introduction

Jan Räbiger is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His innovative approach has led to advancements that enhance the precision and efficiency of polishing processes in semiconductor manufacturing.

Latest Patents

Jan Räbiger holds a patent for a "Method of controlling the chemical mechanical polishing of stacked layers having a surface topology." This improved CMP controller allows for the calculation of the polish time required to remove a patterned layer stack to a desired final thickness. The method utilizes the initial layer thickness of each layer in the stack, a topography factor that characterizes the surface structure, and a selectivity factor that defines the removal rates between adjacent material layers. The controller's state variable, represented by the removal rate of one of the layers, can be periodically updated based on previously calculated polish times and measurements of the final layer thickness. This innovation is particularly beneficial for CMP processes involving STI isolation structures, where precise control of the final thickness of a CMP stop layer is crucial.

Career Highlights

Jan Räbiger is currently employed at Advanced Micro Devices Corporation, where he continues to develop and refine technologies that impact the semiconductor industry. His work focuses on improving the efficiency and effectiveness of CMP processes, which are vital for the production of advanced microchips.

Collaborations

Jan has collaborated with several professionals in his field, including Dirk Wollstein and Stefan Lingel. These collaborations have fostered an environment of innovation and have contributed to the advancement of CMP technologies.

Conclusion

Jan Räbiger's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patent and ongoing work at Advanced Micro Devices Corporation highlight his role as a key player in the semiconductor industry.

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