Hamburg, Germany

Jan Rühaak

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ibeo Automotive Systems Gmbh. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Rühaak. Retrieved from https://idiyas.com/inventor/jan-rühaak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Jan Rühaak: Innovator in Optical Distance Measurement

Introduction

Jan Rühaak is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of optical distance measurement. His innovative approach has led to the development of a unique method that enhances measurement accuracy and efficiency.

Latest Patents

Rühaak holds a patent for a "Method and device for optical distance measurement." This invention involves emitting a plurality of measurement pulses, which are then reflected off at least one object within a specified measurement range. The method includes the emission of N subsets of measurement pulses, each with a constant pulse interval. Notably, the least common multiple of these intervals corresponds to at least twice the length of the measurement range, ensuring precise measurements.

Career Highlights

Throughout his career, Jan Rühaak has worked with prominent companies in the technology sector. He has been associated with Ibeo Automotive Systems GmbH, where he contributed to advancements in automotive technology. Additionally, he has worked with Microvision, Inc., further expanding his expertise in optical technologies.

Collaborations

Rühaak has collaborated with various professionals in his field, including Wolfgang Birnbacher, enhancing the development of innovative solutions in optical measurement.

Conclusion

Jan Rühaak's contributions to optical distance measurement exemplify his innovative spirit and dedication to advancing technology. His patent and career achievements reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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