Jan H King

Title: Innovations by Jan H. King in Wafer Polishing Technology

Introduction

Jan H. King is an accomplished inventor based in Sunnyvale, California. She has made significant contributions to the field of wafer polishing technology, holding two patents that enhance the efficiency and effectiveness of the polishing process. Her innovative designs focus on reducing the forces required to release wafers from polishing surfaces, which is crucial in semiconductor manufacturing.

Latest Patents

Jan H. King's latest patents include a "Wafer polisher head adapted for easy removal of wafers" and a "Rotary union for coupling fluids in a wafer polishing apparatus." The first patent describes a device that reduces the forces needed to release a wafer from a wet polishing surface after polishing. This device features an attachment that can tilt relative to the polishing surface, creating an unbalanced force that facilitates the separation of the wafer. The second patent outlines a rotary union that continuously communicates fluid between a nonrotating source and a fluid chamber within a rotatable polishing head, further improving the polishing process.

Career Highlights

Jan H. King has established herself as a key figure in her field through her work at Cybeq Systems, Inc. Her innovative approaches have not only advanced technology but have also contributed to the efficiency of semiconductor manufacturing processes.

Collaborations

Jan has collaborated with notable coworkers, including Konstantine Volodarsky and Jiro Kajiwara, who have supported her innovative endeavors in wafer polishing technology.

Conclusion

Jan H. King's contributions to wafer polishing technology exemplify her commitment to innovation and excellence in the field. Her patents reflect a deep understanding of the challenges in semiconductor manufacturing and provide effective solutions to enhance the polishing process.