Vilters, Switzerland

Jan Grünenfelder

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Matriq Ag. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Grünenfelder. Retrieved from https://idiyas.com/inventor/jan-grünenfelder

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Jan Grünenfelder: Innovator in Thermal Marking Technology

Introduction

Jan Grünenfelder is a notable inventor based in Vilters, Switzerland. He has made significant contributions to the field of thermal marking technology. His innovative approach has led to the development of a unique device that enhances the marking process for work pieces.

Latest Patents

Grünenfelder holds a patent for a "Mold and device for marking work pieces." This device is designed for marking work pieces that undergo thermal processes. It features a plurality of heating elements that are distributed laterally on a surface, which is placed against the work piece. These heating elements can be individually controlled for localized heating, allowing for precise marking. Each heating element consists of a solid material with a surface structure that can be heated through an integrated heating structure.

Career Highlights

Jan Grünenfelder is associated with Matriq AG, where he applies his expertise in thermal marking technology. His work has been instrumental in advancing the capabilities of marking devices, making them more efficient and effective.

Collaborations

Grünenfelder collaborates with talented individuals such as Klaus Dietrich and Mathias Mächler. Their combined efforts contribute to the innovative projects at Matriq AG.

Conclusion

Jan Grünenfelder's contributions to thermal marking technology exemplify the spirit of innovation. His patent and work at Matriq AG highlight his commitment to advancing industrial marking processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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