Company Filing History:
Years Active: 1981
Title: Jan Goorissen: Innovator in Semiconductor Manufacturing
Introduction
Jan Goorissen is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in the technology sector.
Latest Patents
Jan Goorissen holds a patent for a method of manufacturing a semiconductor device. This method involves forming a masking layer on a part of a surface of a monocrystalline semiconductor body. The semiconductor body is then subjected to an epitaxial treatment from a gaseous phase. An epitaxial layer is deposited, with a portion on the uncovered part of the surface being monocrystalline and a portion on the masking layer being polycrystalline. The method is characterized by the deposition of an amorphous or polycrystalline layer on both the masking layer and the uncovered part of the surface at a lower temperature than that of the epitaxial layer. This layer allows the uncovered surface part to change into a monocrystalline state through thermal treatment before the deposition of the epitaxial layer. Jan Goorissen has 1 patent to his name.
Career Highlights
Jan Goorissen is associated with U.S. Philips Corporation, where he has contributed to various projects in semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.
Collaborations
Jan Goorissen has collaborated with Lambertus J Bollen, working together to advance their research and development efforts in the semiconductor field.
Conclusion
Jan Goorissen's innovative approach to semiconductor manufacturing has made a lasting impact on the industry. His contributions continue to influence the development of advanced technologies.