Company Filing History:
1 out of 9 
1 out of 1 Years Active: 2021
Title: Jan Brulik: Innovator in Semiconductor Etching Technology
Introduction
Jan Brulik is a notable inventor based in Brno, Czech Republic. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods of etching mixed metal and dielectric layers. His work has implications for various applications in the semiconductor industry.
Latest Patents
Jan Brulik holds a patent for a method of etching one or more mixed metal and dielectric layers of a semiconductor device. This method performs both planar and cross-sectional etching of semiconductor devices composed of multiple layers of dissimilar materials, such as metals and dielectrics. The technique aims to either expose a single layer of interest or cross-section several layers for applications including nanoprobing, circuit editing, and failure analysis. The process involves directing an ion beam toward a defined area on the semiconductor device in the presence of an etching agent. This results in the removal of portions of the mixed metal and dielectric layer, producing a recess with at least one substantially smooth and planar surface. The etching agent used contains oxidizing and reducing elements in an optimized ratio, ensuring that the quantity of oxidizing elements exceeds that of reducing elements by one.
Career Highlights
Throughout his career, Jan Brulik has worked with prominent companies in the semiconductor field, including Tescan Brno, S.r.o. and Orsay Physics. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.
Collaborations
Jan has collaborated with notable professionals in his field, including Gregory Goupil and Sharang. These partnerships have further enhanced his work and innovation in semiconductor etching methods.
Conclusion
Jan Brulik is a distinguished inventor whose contributions to semiconductor etching technology have paved the way for advancements in the industry. His innovative methods and collaborations reflect his commitment to enhancing semiconductor device fabrication.