Company Filing History:
Years Active: 2000
Title: James T Marsh: Innovator in Pattern Definition Technology
Introduction
James T Marsh is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of pattern definition technology, particularly through his innovative patent. His work is recognized for its practical applications in various industries.
Latest Patents
James T Marsh holds a patent for a "Process for defining a pattern using an anti-reflective coating." This patent outlines a method where a pattern in a surface is defined by providing a hard mask material on the surface. The process involves depositing an anti-reflective coating on the hard mask material, applying a photoresist layer on the anti-reflective coating, and patterning the photoresist layer, anti-reflective layer, and hard mask material. The remaining portions of the photoresist layer and anti-reflective layer are then removed, allowing for the substrate to be patterned using the hard mask as a mask. Additionally, the patent includes a structure for defining a pattern in a surface, which consists of a surface with a hard mask material, an anti-reflective coating, and a photoresist layer. An etchant composition for removing the hard mask material is also provided, comprising an aqueous composition of HF and chlorine. James T Marsh has 1 patent to his name.
Career Highlights
James T Marsh is associated with International Business Machines Corporation (IBM), where he has contributed to various projects and innovations. His work has been instrumental in advancing technologies related to pattern definition and anti-reflective coatings.
Collaborations
Some of his notable coworkers include James William Adkisson and Michael Caterer. Their collaborative efforts have further enhanced the innovative environment at IBM.
Conclusion
James T Marsh is a distinguished inventor whose work in pattern definition technology has made a significant impact in his field. His patent demonstrates a clear understanding of the complexities involved in surface patterning, showcasing his expertise and innovative spirit.