Company Filing History:
Years Active: 1992-1999
Title: The Innovations of James Richard Murray
Introduction
James Richard Murray is a notable inventor based in Owego, NY (US). He has made significant contributions to the field of technology, particularly in the area of photoresist stripping methods. With a total of 3 patents to his name, Murray's work has garnered attention for its innovative approaches.
Latest Patents
Murray's latest patents include a groundbreaking method for stripping photoresist. This method utilizes a hot hydrogen atmosphere, allowing organic photoresists to be quickly, conveniently, and completely stripped. The substrates are exposed to this atmosphere using a hydrogen conveyor furnace. The gases produced from the furnace are burned to carbon dioxide and water, effectively eliminating the need for disposing of a stripping agent. This innovative approach not only enhances efficiency but also promotes environmental sustainability.
Career Highlights
James Richard Murray is currently associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop advanced technologies that have practical applications in various industries.
Collaborations
Murray has collaborated with several talented individuals throughout his career, including David W Sissenstein, Jr and Rebecca Christine Lutsic. These collaborations have contributed to the successful development of his innovative patents.
Conclusion
James Richard Murray's contributions to the field of technology, particularly in photoresist stripping methods, highlight his innovative spirit and dedication to advancing industry practices. His work continues to influence the way photoresists are handled, showcasing the importance of innovation in technology.