James Lam

Title: Innovations of James Lam

Introduction

James Lam is an accomplished inventor based in Oakland, CA. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods for film deposition and substrate heating. With a total of 2 patents, Lam's work has advanced the technology used in the production of electronic devices.

Latest Patents

One of Lam's latest patents is a method for depositing fluorine-doped silicon dioxide films. This process involves supplying reactant gases containing silicon, oxygen, and fluorine into a process chamber while generating plasma. The substrate is supported in the chamber, allowing for the growth of a fluorine-containing silicon oxide film at elevated temperatures. The method ensures a fluorine content of 2-12 atomic percent in the film, enhancing its moisture resistance. Another notable patent is a method for microwave plasma substrate heating. This technique involves supplying a heatup gas into a plasma processing chamber, where it is energized with microwave power to heat the substrate's surface. A reactant gas is then introduced and energized into a plasma state to process the substrate effectively.

Career Highlights

James Lam is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in the development of advanced manufacturing technologies.

Collaborations

Throughout his career, Lam has collaborated with notable colleagues, including David T. Hodul and Dean R. Denison. These collaborations have contributed to the successful development of innovative technologies in the semiconductor field.

Conclusion

James Lam's contributions to semiconductor technology through his patents and work at Lam Research Corporation highlight his role as a significant inventor in the industry. His innovative methods continue to influence the manufacturing processes of electronic devices.